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67-109 12.5 mm Dia. Mounted Hard Coated OD 4.0 Notch Filter 514.5nm

67-109 12.5 mm Dia. Mounted Hard Coated OD 4.0 Notch Filter 514.5nm

Type
Filter
Subtype
Notch Filter
Brand
Edmund Optics
Product webpage
Edmund Optics products in the 3DOptix catalog

Properties

Shape
Circular
Diameter
12.5 mm

Material

Name
UVFS
Dispersion Equation
Sellmeier
n (λ)
1.4615564020500096
λ
514.5 nm
B1
0.6961663
C1
0.004679148 μm2
B2
0.4079426
C2
0.013512063 μm2
B3
0.8974794
C3
97.93400254 μm2

67-109 12.5 mm Dia. Mounted Hard Coated OD 4.0 Notch Filter 514.5nm

The 67-109 is a Notch Filter with a diameter of 12.5 mm, sourced from the renowned optical components vendor, Edmund Optics. This filter is specifically designed to block a narrow band of wavelengths around 514.5 nm while allowing light at other wavelengths to pass through. This makes it an ideal choice for applications where rejection of specific wavelengths is required.

The filter is manufactured with a base shape of Circular, ensuring uniformity and consistency in its application. It is made from UVFS MAL-1965, a material known for its optical properties and durability. The filter has a thickness of 5 mm, providing sufficient structural integrity while minimizing optical distortion.

The 67-109 filter features hard coating on both the front and back surfaces, denoted as 'edm 67-109'. This coating enhances the filter's durability and resistance to wear and tear, ensuring long-lasting performance. The coating also aids in reducing surface reflections, improving the overall transmission efficiency of the filter.

The filter's geometry is defined by its diameter and thickness. With a diameter of 12.5 mm, it is suitable for use in compact optical systems where space is a constraint. The thickness of 5 mm provides a balance between structural strength and optical performance.

The filter's physical data includes a Center Wavelength (CWL) of 514.5 nm, which is the wavelength at which the filter provides maximum transmission. This CWL is crucial in determining the filter's effectiveness in specific applications.

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