PL-360LP Photolithography Mask Aligner Filter 215x215mm 215.90 mm x 215.90 mm Protected Coating; Longpass Filter Protected Coating
- Type
- Filter
- Subtype
- Longpass Filter
- Brand
- Omega Optical
Properties
- Shape
- Rectangular
- Cut Off Frequency
- Cut On Frequency
- 360 nm
Material
- Name
- UVFS
- Dispersion Equation
- Sellmeier
- n (λ)
- 1.458448271212196
- λ
- 588 nm
- B1
- 0.6961663
- C1
- 0.004679148 μm2
- B2
- 0.4079426
- C2
- 0.013512063 μm2
- B3
- 0.8974794
- C3
- 97.93400254 μm2
PL-360LP Photolithography Mask Aligner Filter 215x215mm
The PL-360LP Photolithography Mask Aligner Filter, offered by Omega Optical, is a high-quality optical component designed for photolithography applications. This filter, with a catalog number 3203, is available for purchase and is currently in stock on the vendor's website.
The filter is of the Longpass type, which means it allows transmission of longer wavelengths while blocking shorter ones. The cut-on wavelength for this filter is 360 nanometers, and it has no specified cut-off wavelength. This characteristic makes it ideal for applications where longer wavelengths need to be isolated.
The filter is rectangular in shape, with a base material identified as UVFS MAL-1965. It measures 215.90 millimeters in both width and height, making it suitable for use in systems with similar dimensions. The filter has a thickness of 2 millimeters, providing sufficient structural integrity for handling and installation.
The filter's front and back surfaces are coated with Omega's PL360LPFIL215X21 coating, which is designed to enhance the filter's performance and durability. The coating provides a longpass filtering effect, further enhancing the filter's ability to block shorter wavelengths.
The filter's shape is described as a Thin Lens, suggesting that it may have some light-focusing capabilities. However, this is not explicitly stated in the provided data, so it should be confirmed with the vendor if this is a critical factor for your application.
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